C - Chemistry – Metallurgy – 07 – K
Patent
C - Chemistry, Metallurgy
07
K
167/103, 167/234
C07K 5/02 (2006.01) A61K 31/425 (2006.01) A61K 38/55 (2006.01) C07D 277/04 (2006.01) C07D 417/14 (2006.01)
Patent
CA 2017163
- 30 - ABSTRACT New thioproline derivatives of the general formula Image (I) wherein X stands for an dialkyl acetal group or other different groups derived from the CHO group, and an anti- amnestic agent and a proline endopeptidase inhibitor containing these compounds as active ingredient.
Okajima Satoru
Sawada Seigo
Kabushiki Kaisha Yakult Honsha
Kirby Eades Gale Baker
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