C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 495/02 (2006.01) A61K 31/445 (2006.01) A61K 31/495 (2006.01) A61K 31/55 (2006.01) C07D 335/06 (2006.01) C07D 409/06 (2006.01) C07D 495/04 (2006.01) C07D 495/10 (2006.01) C07D 495/20 (2006.01) C07D 497/00 (2006.01)
Patent
CA 2179680
A thiopyran derivative represented by the following formula (I) or (I'), or the salt thereof. Image (I) Image (I') wherein A is S or -CH=CH-; the dotted line indicates that the bond may be either present or absent; Z and Z' are typically Image or Image ; L is an ethylene or trimethylene group; Y is CH or N; n is 2; B is a carbonyl group; m is 0 or 1; D is a phenyl group; and E1 and E2 are hydrogen atoms. These compounds exhibit a strong serotonin-2 blocking action and highly safe. Some compounds also exhibit an .alpha.1-blocking action and therefore are useful as an antihypertensive agent with less side effects. Thus, the thiopyran derivatives are useful as drugs for the treatment of circulatory diseases in general such as hypertension, ischemic heart disease, cerebrovascular disturbance, and peripheral circulatory disturbance.
Inomata Norio
Iwamori Tomoe
Mizuno Akira
Shibata Makoto
Daiichi Suntory Pharma Co. Ltd.
Gowling Lafleur Henderson Llp
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