Tool, especially cutting tool and method for the cvd...

Details Tool, especially cutting tool and method for the cvd... Tool, especially cutting tool and method for the cvd...

C - Chemistry, Metallurgy

23

C

C23C 16/30 (2006.01) C23C 30/00 (2006.01)

Patent

CA 2524643

The invention relates to a tool, especially a cutting tool, comprising a substrate member onto which at least one layer is deposited by means of CVD, and a method for the chemical vapor deposition of a two-phase layer on a sintered part. According to the invention, the single deposited layer or at least one of the layers is provided with a TiCN phase, TiOCN phase, TiOC phase, or TiC phase and an additional phase consisting of ZrO2 and/or HfO2. CH3CN, C5H5N, or C6H6 is used in the gas atmosphere for producing such a layer in addition to TiC14, HfC14, and/or ZrCl4 and CO2, the remainder being composed of H2 and/or Ar.

L'invention concerne un outil, notamment un outil de coupe, constitué d'un substrat sur lequel est déposé au moins une couche selon un procédé de dépôt chimique en phase vapeur. L'invention concerne également un procédé pour réaliser un dépôt chimique en phase vapeur d'une couche à deux phases sur un corps fritté. Selon l'invention, la seule couche ou au moins une des couches présente, outre une phase TiCN ou TiOCN ou TiOC ou TiC, une autre phase constituée de ZrO¿2? et/ou de HfO¿2?. Pour produire une telle couche, on utilise dans l'atmosphère gazeuse non seulement du TiCl¿4?, du HfCl¿4? et/ou du ZrCl¿4? et du CO¿2?, mais aussi du CH¿3?CN ou du C¿5?H¿5?N ou du C¿6?H¿6?, un reste H¿2? et/ou du Ar.

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