G - Physics – 03 – F
Patent
G - Physics
03
F
96/252, 204/91.3
G03F 7/26 (2006.01) G03F 7/038 (2006.01)
Patent
CA 1267378
FI9-64-046 TOP IMAGED PLASMA DEVELOPABLE RESISTS Abstract The present invention is concerned with a method of converting the upper portion of a layer of polymeric resist into a dry etch resistant form. Oxygen plasma can then be used to develop the entire resist structure. The layer of polymeric resist is exposed to patterned radiation which creates labile and reactive hydrogens within the resist by molecular rearrangement. The reactive hydrogens within the upper portion of the layer are subsequently reacted with a silylating reagent to form a dry etch resistant compound. When the polymeric resist material is highly absorbent of the radiation, the reactive hydrogens are created only in the upper portion of the layer; when the polymeric resist material is more transparent, the formation of the dry etch resistant upper portion must be controlled via the degree of penetration of the silylating reagent into the layer.
495093
Chiong Kaolin N.
Chow Ming-Fea
Yang Jer-Ming
International Business Machines Corporation
Saunders Raymond H.
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