Topographical selective patterns

Details Topographical selective patterns Topographical selective patterns

B - Operations, Transporting

23

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B23K 10/00 (2006.01) B29C 59/14 (2006.01) B29C 59/16 (2006.01) B41M 5/24 (2006.01) H05K 3/02 (2006.01) B29C 35/08 (2006.01) H05K 3/10 (2006.01)

Patent

CA 2097388

TOPOGRAPHICAL SELECTIVE PATTERNS Abstract of the Disclosure A maskless process generates a patterned coating on a polymeric substrate, wherein the pattern is at least partially defined by the substrate topography. The process uses a high intensity/high fluence energy source to strike a coated substrate, thus selectively removing a portion of the coating. The amount and area of the coating removed is dependent on the substrate topography and the applied energy, and this forms a pattern of residual coating material on the substrate. 48475POR.APP

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