Transparent, conductive film with a large birefringence

G - Physics – 02 – F

Patent

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Details

G02F 1/133 (2006.01) G02F 1/13363 (2006.01) H01L 49/02 (2006.01)

Patent

CA 2623124

A thin film is formed by depositing a wide bandgap semiconductor material on a substrate by oblique physical vapor deposition to form a thin film structure. The thin film structure is transparent, electrically conductive, and birefringent.

L'invention porte sur un film mince formé par dépôt d'un matériau semi-conducteur à grande largeur de bande interdite sur un substrat par déposition physique oblique en phase vapeur. La structure dudit film est électroconductrice, transparente et biréfringente.

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