Transparent dissolution rate modifiers for photoresists

Details Transparent dissolution rate modifiers for photoresists Transparent dissolution rate modifiers for photoresists

G - Physics

03

F

96/158

G03F 7/022 (2006.01) G03F 7/004 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2023423

ABSTRACT A photosensitive composition containing an alkali soluble resin, a quinone diazide compound and a transparent, hydrophobic plasticizer which is preferably a dihydroabietyl phthalate, in a solvent mixture. After drying and imagewise exposing, the composition is developed to produce a photoresist image.

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