Transparent, heat reflective, metal oxide films

Details Transparent, heat reflective, metal oxide films Transparent, heat reflective, metal oxide films

C - Chemistry, Metallurgy

23

C

204/167, 204/96.

C23C 14/08 (2006.01) C03C 21/00 (2006.01)

Patent

CA 1216821

ABSTRACT A method of producing a transparent, heat reflec- tive metal oxide film on a substrate is provided. Metal is sputtered from a target of the metal partially covered by a baffle, toward the substrate. Oxygen is admitted between the substrate and baffle at a rate so as to oxidize less than all the metal sputtered toward the substrate, while not oxidizing the target. Metal is also selectively sputtered from the film deposited on the substrate, so as to form an oxygen deficient, transparent, heat reflective metal oxide film on the substrate. Preferably, the latter step is accomplished by applying a negative potential to the substrate, such being applied by means of an r.f. where the substrate is a dielectric. An apparatus is also provided to carry out the foregoing method. By means of the method and apparatus, novel zinc oxide films have been produced with high transparence and heat reflection characteristics.

440140

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