C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
402/239
C08G 69/26 (2006.01)
Patent
CA 1063293
ABSTRACT OF THE DISCLOSURE: Transparent polyamides, containing residues of terephthalic acid and 2-methylpentamethylendiamine. These are characterised by the presence of residues of 2-ethyl- tetramethylendiamine and/or of isophtalic acid in a con- centration altogether of 15 - 30 % by gram molecule, relative to the sum of all diamine - or all dicarboxylic acid - residues. The polyamides of the invention have good mechanical properties and good solvent resistance, more particularly alcohol resistance, and are suitable for use in the pro- duction of mold bodies with permanent transparency.
261957
Aus Der Funten Helmut
Bier Gerhard
Blaschke Franz
Schade Gerhard
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