Treatment of a chemical

Details Treatment of a chemical Treatment of a chemical

C - Chemistry, Metallurgy

01

G

C01G 25/02 (2006.01) C01B 33/037 (2006.01) C01B 33/10 (2006.01) C01B 33/12 (2006.01) C01G 25/04 (2006.01)

Patent

CA 2141162

A process for treating dissociated zircon comprises reacting dissociated zircon with gaseous hydrogen fluoride at an elevated reaction temperature. The reaction temperature is controlled to obtain at least one desired zirconium-based compound and at least one desired silicon-based compound.

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