C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/550.5
C07C 233/00 (2006.01) A61K 31/165 (2006.01) A61K 31/166 (2006.01)
Patent
CA 1130316
ABSTRACT OF THE DISCLOSURE The invention provides compounds of the general formula Image (I) in which The amide radicals -CO-NR1R2 and -CO-NR3R4 are different from one another, and R1 represents a hydrogen atom or a lower alkyl radical, R2 represents a mono- or poly-hydroxyalkyl radical, R3 represents a hydrogen atom or a lower alkyl radical, R4 represents a mono- or poly-hydroxyalkyl radical, R5 represents a lower alkyl radical or a lower alkyl radi- cal substituted by 1 or more of the same or different substi- tuents selected from hydroxy groups and lower alkoxy radicals, R6 represents a hydrogen atom, a lower alkyl radical or a mono- or poly-hydroxy-lower alkyl radical, useful as X-ray contrast agents, especially for intravascular, subarachnoidal and local application.
347227
Blaszkiewicz Peter
Klieger Erich
Seidelmann Dieter
Speck Ulrich
Marks & Clerk
Schering Aktiengesellschaft
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