C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 249/08 (2006.01) A61K 31/41 (2006.01) C07C 323/22 (2006.01) C07D 303/34 (2006.01) C07D 303/48 (2006.01) C07D 521/00 (2006.01)
Patent
CA 2256060
Described is a triazole derivative represented by the formula (1): (see fig. I) wherein R1 represents a hydrogen atom, a lower alkyl group or an aralkyl group, X1 and X2 are the same or different and each independently represents a hydrogen atom, a halogen atom or a halogenoalkyl and n stands for an integer of 0 to 2, or salt thereof; a preparation process of said compound and a pharmaceutical comprising said compound as an effective ingredient. The compound as described above has high antimycotic activity and is useful for the prevention and treatment of mammalian mycotic infections.
Asaoka Takemitsu
Eto Hiromichi
Ishida Kazuya
Kaneko Yasushi
Maebashi Kazunori
Gowling Lafleur Henderson Llp
Ssp Co. Ltd.
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