C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 249/08 (2006.01) A61K 31/41 (2006.01) C07C 323/22 (2006.01) C07D 303/34 (2006.01) C07D 521/00 (2006.01)
Patent
CA 2260421
Described is a triazole derivative represented by the formula (1): (see fig. I) wherein R1 represents a hydrogen atom, a lower alkyl group or an aralkyl group, X1 and X2 are the same or different and each independently represents a hydrogen atom, a halogen atom or a halogenoalkyl and n stands for an integer of 0 to 2, or salt thereof; a preparation process of said compound and a pharmaceutical comprising said compound as an effective ingredient. The compound as described above has high antimycotic activity and is useful for the prevention and treatment of mammalian mycotic infections.
Asaoka Takemitsu
Eto Hiromichi
Ishida Kazuya
Kaneko Yasushi
Maebashi Kazunori
Gowling Lafleur Henderson Llp
Ssp Co. Ltd.
LandOfFree
Triazole derivative or salt thereof, preparation process... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Triazole derivative or salt thereof, preparation process..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Triazole derivative or salt thereof, preparation process... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-2082814