C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/236, 260/313
C07D 249/08 (2006.01) A61K 31/41 (2006.01) C07D 521/00 (2006.01)
Patent
CA 2031892
A triazole derivative is disclosed. The compound has the general formula: (see formula I) wherein R1 and R2 represent a hydrogen atom or a lower alkyl group, or R1 and R2 together form a lower alkylene group, R3 represents a lower alkyl group, and n denotes an integer of 0 to 2, provided that not both R1 and R2 are a hydrogen atom at the same time. The triazole derivatives and their salts are effective for curing or preventing deep-seated mycoses, e.g. mycotic meningitis, mycotic infectious diseases of respiratory organs, fungemia, and urinary tract mycosis.
Asaoka Takemitsu
Kanamaru Yoshihiko
Kawahara Ryuichi
Kuraishi Tadayuki
Maebashi Kazunori
Gowling Lafleur Henderson Llp
Ss Pharmaceutical Co. Ltd.
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