C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 249/08 (2006.01) A61K 31/41 (2006.01) A61K 31/44 (2006.01) A61K 31/495 (2006.01) A61K 31/535 (2006.01) C07D 401/02 (2006.01) C07D 403/02 (2006.01) C07D 405/02 (2006.01) C07D 409/02 (2006.01) C07D 413/02 (2006.01) C07D 417/02 (2006.01) C07D 521/00 (2006.01)
Patent
CA 2084334
ABSTRACT OF THE DISCLOSURE: The present invention relates to a compound represented by the general formula (1) or its salt, a process for producing the same, and an antifungal agent comprising the same as an effective component: Image (1) wherein R1 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted heterocyclic group bonded through a carbon atom in the ring to the main chain; R2 presents a hydrogen atom, a fluorine atom or a substituted or unsubstituted alkyl group; and R3 represents a cyano group, a thioamido group or a group represented by the formula Image , Image or Image in which R4 is a hydroxyl group or a group of the formula Image (R7 and R8, which may be the same or different, are hydrogen atoms or substituted or unsubstituted alkyl, alkenyl, alkynyl, cycloalkyl, aryl, amino, alkoxy, hydroxyl or hetero- cyclic groups, and may form a substituted or unsubsti- tuted heterocyclic group together with the nitrogen atom to which R7 and R8 attach), R5 is a substituted or unsubstituted alkoxy group or a group of the formula Image (R7 and R8 are as defined above), and R6 is a hydrogen atom or a substituted or unsubstituted alkyl group.
Imaizumi Hiroyuki
Kajita Tetsuya
Mitsuyama Junichi
Narita Hirokazu
Sakai Hiroshi
Marks & Clerk
Toyama Chemical Co. Ltd.
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