C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 471/04 (2006.01) A61K 31/50 (2006.01) A61K 31/535 (2006.01) A61K 31/55 (2006.01) A61K 38/04 (2006.01) C07D 471/06 (2006.01) C07D 519/00 (2006.01) C07K 5/04 (2006.01)
Patent
CA 2048511
ABSTRACT OF THE DISCLOSURE A tricyclic compound represented by the general formula (1) and salts thereof. Image (1) A method for producing the tricyclic compound and salts thereof, and an antimicrobial agent containing the tricyclic compound and salts thereof as an active ingredient are also disclosed.
Hatono Shunso
Hayashi Norihiro
Inoue Satoshi
Kuramoto Yasuhiro
Yazaki Akira
Fujisawa Pharmaceutical Co. Ltd.
Gowling Lafleur Henderson Llp
Hatono Shunso
Hayashi Norihiro
Inoue Satoshi
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