C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/317, 260/306
C07D 209/56 (2006.01) C07C 61/39 (2006.01) C07D 209/66 (2006.01) C07D 209/70 (2006.01) C07D 491/04 (2006.01) C07D 491/044 (2006.01) C08G 85/00 (2006.01) G03F 7/038 (2006.01)
Patent
CA 1128950
Abstract Nov? tricyclic imidyl derivatives, for example those of the formula Image [n=1 or 2, Y= a bridge member and X = a functional group] are described. The novel tricyclic imidyl derivatives are suitable for the preparation of photocrosslinkable polymers by incorporation into existing polymer chains or by building up the polymer chain from tricyclic imidyl derivatives, according to the definition, with suitable The photocrosslinkable polymers obtained by this means can be used, for example, to produce printing plates for the offset printi? process and especially as photo- resists.
320890
Bellus Daniel
Schilling Walter
Storni Angelo
Zweifel Hans
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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