C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 487/04 (2006.01) A61K 31/445 (2006.01) A61K 31/495 (2006.01) A61K 31/55 (2006.01) C07D 519/00 (2006.01)
Patent
CA 2086112
-240- ABSTRACT Novel tricyclic triazolo derivatives and pharmaceutically acceptable salts thereof, which are useful as anti-inflammation agents, anti-allergy agents or anti-PAF agents as well as processes for producing the same are disclosed. The triazolo derivatives of the present invention are represented by the formula (I): Image (I) [wherein R1 represents hydrogen, lower alkyl or C3 - C5 cycloalkyl; R2 and R3 respectively represent hydrogen, lower alkyl, lower alkoxy or halogen; W represents C=O or CR4R5 (wherein R4 and R5 respectively represents hydrogen or lower alkyl); A represents C1 - C5 straight or branched saturated or unsaturated alkylene which may contain one or more hetero atoms; 1 represents 0 to 2, n represents 1 to 3, ??? represents single bond or double bond; Y represents N or C; Z represents C(B)Ar1Ar2 (wherein B represents hydrogen, hydroxy or methoxy, Ar1 and Ar2 respectively represent hydrogen or substituted or non-substituted aryl), CAr1Ar2 (wherein Ar1 and Ar2 represent the same meanings as mentioned above), O- CHAr1Ar2 (wherein Ar1 and Ar2 represent the same meanings -241- as mentioned above) or condensed aromatic ring]
Imaoka Takayuki
Kaneko Masayuki
Katou Tetsuya
Makino Tetsuya
Shibayama Katsuhiro
Smart & Biggar
Toray Industries Inc.
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