C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/241.31
C07D 223/26 (2006.01) C07D 223/22 (2006.01)
Patent
CA 1042887
CHEMICAL COMPOUNDS Abstract of the Disclosure Novel dibenzazepines having notable anti-depressant activity are described of the general formula Image They are produced by reacting a compound of the formula Image or an N-alkali metal derivative thereof with a reagent of the formula Image
207647
Barton Derek H.r.
Hesse Robert H.
LandOfFree
Trifluoromethoxy dibenzodiazepine derivatives does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Trifluoromethoxy dibenzodiazepine derivatives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Trifluoromethoxy dibenzodiazepine derivatives will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-309792