Trifluoromethyl substituted compounds having antidepressive...

C - Chemistry – Metallurgy – 07 – C

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260/487.7

C07C 69/63 (2006.01) A61K 31/195 (2006.01) A61K 31/21 (2006.01) A61K 31/22 (2006.01) C07C 69/22 (2006.01)

Patent

CA 1069926

ABSTRACT OF THE DISCLOSURE Compounds of formula Image together with their pharmaceutically acceptable salts, and processes for their preparation, are described. These compounds find use as anti-depressants. Compared to known drugs, these compounds have in- creased effectiveness and a reduced frequency of side effects.

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