Trifluorostyrene sulfonic acid membranes

Details Trifluorostyrene sulfonic acid membranes Trifluorostyrene sulfonic acid membranes

H - Electricity

01

M

319/12, 204/202,

H01M 2/14 (2006.01) C25B 13/08 (2006.01)

Patent

CA 1052858

ABSTRACT This disclosure is directed to fluorocarbon polymers, polymeric membranes, and electrochemical cells and processes. The polymers and membranes are produced by radiation techniques to provide improved products. For example .alpha. ,.beta. ,.beta. -trifluorostyrene in an inert organic solvent is grafted onto an inert film, such as tetra- fluoroethylene-hexafluoropropylene copolymer, by irradiation, i.e. with Co-60 gamma radiation at a dose of several Mrad. The grafted film is then sulfonated, preferably in a chloro-sulfonic acid bath. The resulting film is useful as a membrane or diaphragm in various electrochemical cells such as chlor-alkyl or fuel cells.

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