C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/36, 260/550.
C07D 209/48 (2006.01)
Patent
CA 1129438
ABSTRACT The invention provides a compound of the general formula Image (I) in which X represents an unsubstituted or substituted lower alkylene radical, R represents a hydrogen atom or a lower alkyl radical, R represents a hydrogen atom, a lower alkyl radical or a lower mono- or poly- hydroxyalkyl radical, R3 represents a hydrogen atom, a lower alkyl radi- cal or a lower mono- or poly- hydroxyalkyl radical, R4 represents a hydrogen atom, a lower alkyl radical or a lower mono- or poly- hydroxyalkyl radical, R5 represents a lower mono- or poly-hydroxyalkyl radical, R6 represents a hydrogen atom, a lower alkyl radi- cal or a lower mono- or poly- hydroxyalkyl radical, R7 represents a lower mono- or poly-hydroxyalkyl radical, salts thereof, processes for their preparation and use as X-ray contrast agents. Preferred salts are those with contrast agent acids. These salts are stable and excellently tolerable. Their solutions have low viscos- ity and therefore highly concentrated but nevertheless readily injectable X-ray contrast agent solutions can be manufactured.
355900
Klieger Erich
Mutzel Wolfgang
Speck Ulrich
Marks & Clerk
Schering Aktiengesellschaft
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