Tunable phase mask assembly

G - Physics – 02 – B

Patent

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G02B 6/02 (2006.01)

Patent

CA 2465292

A tunable phase mask assembly (10) for use in photoinducing an optical wavelength filter in an optical waveguide. The phase mask assembly includes a phase mask having a length extending between two opposite longitudinal ends. The phase mask has grating corrugations projecting from its surface and distributed with a periodicity along its length. The periodicity of the phase mask is tuned by reversibly changing its length between the two longitudinal ends, such as by compressing or stretching the mask. In this manner, the interference pattern of a light beam passing through the phase mask is also tuned, which allows to control the characteristics of a wavelength filter photoinduced using this phase mask assembly.

Cette invention a trait à un ensemble masque de phase accordable (10), utilisé pour photo-induire un filtre à longueur d'onde optique dans un guide d'onde optique. Cet ensemble masque de phase comporte un masque de phase dont une longueur s'étend entre deux extrémités longitudinales opposées. Ce masque de phase comporte des indentations de réseau de diffraction, faisant saillie depuis sa face, et périodiquement réparties dan le sens de la longueur. On peut accorder la périodicité de ce masque de phase en modifiant de manière réversible la longueur s'étendant entre les deux extrémités longitudinales, notamment en raccourcissant ou en étirant le masque. De la sorte, une configuration d'interférence d'un faisceau lumineux traversant le masque de phase est également accordée, de qui permet d'agir sur les caractéristiques d'un filtre à longueur d'onde photo-induit au moyen de cet ensemble masque.

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