Two-phase distributor system for downflow reactors

B - Operations – Transporting – 01 – J

Patent

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Details

B01J 8/02 (2006.01) B01D 3/00 (2006.01) B01D 3/26 (2006.01)

Patent

CA 2190844

A distributor system (18, 36) for uniformly directing vapor and liquid across the surface of a fixed bed (42) of solids in a downflow reactor (14). A first array of open-ended downpipes (33) has a plurality of vertically spaced elevations of holes (39, 40) above the level of a distributor tray (18). A second array of the downpipes (34) has at least one elevation of holes (41) but no elevation of holes as the same height as the lowermost elevations of holes (40) in the first array (33). The absence of holes causes the liquid flow rate through the distributor tray (18) at a given height to be reduced when that liquid height falls below the elevation of holes (39) second from the bottom in the first array (33).

Système de distribution (18, 36) servant à diriger uniformément de la vapeur et un liquide à travers la surface d'un lit fixe (42) de solides dans un réacteur à écoulement descendant (14). Un premier ensemble de conduits descendants à extrémités ouvertes (33) possède une pluralité de plans horizontaux de trous espacés verticalement (39, 40) situés en dessus du niveau d'un plateau de disttribution (18). Un deuxième ensemble de conduits descendants (34) possède au moins un plan horizontal de trous (41) mais aucun plan horizontal de trous (41) situé au même niveau que les plans horizontaux de trous les plus inférieurs (40) du premier ensemble (33). L'absence de trous provoque la diminution du débit du liquide à travers le plateau de distribution (18) à un niveau donné, quand ledit niveau de liquide tombe en dessous du plan de trous (39) situé en deuxième position depuis la partie inférieure du premier ensemble (33).

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