Two-stage separation process

C - Chemistry – Metallurgy – 02 – F

Patent

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C02F 1/72 (2006.01) B01D 19/00 (2006.01)

Patent

CA 2250888

A process is disclosed for producing an oxidized liquid effluent containing minimal dissolved gases therein, from a subcritical wet oxidation treatment system. The oxidation mixture exiting from the treatment system is separated into a first oxidized liquid effluent and a first gaseous phase as the mixture a first separator vessel operated at a relatively low superatmospheric pressure. Sufficient pressure is maintained in the first gaseous phase to provide the motive force for transport to further treatment or discharge. The first oxidized liquid effluent flows to a second separator vessel operated at essentially atmospheric pressure, where remaining dissolved gases separate from the first oxidized liquid effluent. The second gaseous phase is discharged and the second oxidized liquid effluent is suitable for storage or further treatment. Provision for adjusting the pH of the oxidized liquid effluent during the separation process is also disclosed.

L'invention concerne un procédé visant à produire une phase liquide oxydée avec un minimum de gaz dissous provenant d'un système de traitement par oxydation en milieu liquide. Le mélange d'oxydation provenant du système de traitement pénètre dans une première cuve de séparation fonctionnant à une pression superatmosphérique où les phases liquide et gazeuse se séparent. Les gaz atmosphériques sont acheminés vers un autre traitement ou évacués dans l'environnement. La phase aqueuse s'écoule vers une seconde cuve de séparation fonctionnant à une pression essentiellement atmosphérique où les gaz dissous additionnels se séparent de la phase liquide. Les gaz sont évacués et la phase liquide est appropriée pour être stockée ou subir un autre traitement. L'invention concerne également l'ajustement du pH de la phase liquide au cours du procédé de séparation.

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