Two-step projecting bump for semiconductor chip and method...

H - Electricity – 01 – L

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H01L 21/321 (2006.01) H01L 21/60 (2006.01) H01L 23/485 (2006.01)

Patent

CA 2252102

A two-step projecting bump which is formed on an electrode (4) of a semiconductor chip (8) by melting the end of a metallic wire (1) passed through a capillary (3) to form a metallic ball (2), bonding the ball (2) to the electrode (4), laterally moving and then lowering the capillary (3), welding the wire (1) to the top of the ball (2) bonded to the electrode (4), and tearing off the wire (1). A section (B) in which large crystal grains are grown by the thermal effect of the heat applied to the wire (1) at the time of melting the wire (1) and forming the ball (2) is formed in the joining section of the wire (1) with the ball (2) immediately above the ball (2).

Cette invention concerne une bosse saillante à deux étages, laquelle est formée sur l'électrode (4) d'une puce à semi-conducteur (8) en faisant fondre l'extrémité d'un fil métallique (1) passant dans un capillaire (3), ceci de manière à former une bille métallique (2). La bille métallique (2) est ensuite fixée à l'électrode (4) tandis que le capillaire (3) est déplacé latéralement puis abaissé. Le fil (1) est soudé sur le dessus de la bille (2) fixée à l'électrode (4), puis arraché. On procède enfin à la formation de la section (B) dans laquelle on effectue la croissance de grains de cristaux de grande taille grâce à l'effet thermique de la chaleur appliquée sur le fil (1) au moment de sa fusion et de la formation de la bille (2). Cette section (B) est formée dans la section où le fil (1) est joint à la bille (2) immédiatement au-dessus de cette dernière.

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