C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
260/210
C07H 23/00 (2006.01) C07H 17/08 (2006.01)
Patent
CA 1306249
ABSTRACT OF THE DISCLOSURE: Tylosin derivatives represented by the following general formula (I): Image (I) [wherein R denotes a hydrogen atom, acetyl, propionyl or a radical of Si(R2)3 (in which R2 is a lower alkyl group); with the proviso that, when R1 is hydrogen, R is not Si(R2)3 and R1 stands for a hydrogen atom or a radical of Si(R2)3] are novel compounds, which are useful as intermediates for the synthesis of 4"-acyl derivatives of tylosin because, after introduction of any desired acyl group at the 4"- hydroxyl group, the silyl protective group can be readily removed without liberation of said acyl group. This invention also provides processes for producing said tylosin derivatives. More specifically, it provides a method of selectively protecting 2'- and 4"'-hydroxyl groups of tylosin (those of higher reactivity among the hydroxyl groups involved): a method of selectively protecting only the 4"'-hydroxyl group of tylosin; a method of selectively protecting the 3- and 4"'-hydroxyl groups of 2'-0- acyltylosin: and a method of protecting 3-, 2'- and 4"'- hydroxyl groups of tylosin.
583689
Chiba Hiroyuki
Fukagawa Yasuo
Kiyoshima Kohki
Kominato Kaichiro
Okamoto Rokuro
Mercian Corporation
Robic
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