C - Chemistry – Metallurgy – 09 – D
Patent
C - Chemistry, Metallurgy
09
D
C09D 5/24 (2006.01) C09D 7/12 (2006.01) C09D 201/00 (2006.01) H01L 21/3205 (2006.01)
Patent
CA 2722639
A method of forming conductive features on a substrate, the method includes reacting a metal compound with a reducing agent in the presence of a stabilizer in a reaction mixture comprising the metal compound, the reducing agent, and the stabilizer, wherein the reaction mixture is substantially free of solvent, to form a plurality of metal nanoparticles with molecules of the stabilizer on the surface of the metal nanoparticles. After isolating the plurality of metal nanoparticles, a liquid composition that includes a polymeric binder, a liquid and the plurality of metal nanoparticles with molecules of the stabilizer on the surface of the metal nanoparticles is deposited on a substrate by a liquid deposition technique to form a deposited composition. The deposited composition is then heated to form conductive features on the substrate.
Hu Nan-Xing
Liu Ping
Wigglesworth Anthony
Wu Yiliang
Sim & Mcburney
Xerox Corporation
LandOfFree
Ultra low melt metal nanoparticle composition for thick-film... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ultra low melt metal nanoparticle composition for thick-film..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ultra low melt metal nanoparticle composition for thick-film... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1675836