H - Electricity – 01 – L
Patent
H - Electricity
01
L
H01L 21/336 (2006.01) H01L 21/8247 (2006.01) H01L 27/115 (2006.01)
Patent
CA 2484739
A tiny oxide window, the upper layers (55, 57) are etched leaving the poly-two layer (57) over the laywe (41). The optional nitride spacers (51, 53) remain as protective barriers for the poly-one layer and its underlying oxyde layer. Source and implants (22, 24) may be made using the ONO layer as a self- alignment tool.
Fenêtres minuscules en oxyde dont les couches supérieures (55, 57) sont attaquées chimiquement, laissant la couche poly-deux (57) sur la couche (41). Les éventuels espaceurs en nitrure (51, 53) restent sous forme de barrières protectrices de la couche poly-un et de sa couche d'oxyde sous-jacente. Il est possible de former une source et des implants (22, 24) en utilisant la couche ONO comme outil d'alignement automatique.
Daemen Eleonore
Lojek Bohumil
Renninger Alan L.
Atmel Corporation
Borden Ladner Gervais Llp
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