Ultra-violet lithographic resist composition including a...

Details Ultra-violet lithographic resist composition including a... Ultra-violet lithographic resist composition including a...

G - Physics

03

F

96/161, 96/6

G03F 7/016 (2006.01)

Patent

CA 1132825

Abstract of the Disclosure Phenolic-aldehyde resins sensitized with Meldrum's diazo or an analog thereof are useful as lithographic resists sensitive to deep ultra-violet light.

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