C - Chemistry – Metallurgy – 01 – B
Patent
C - Chemistry, Metallurgy
01
B
C01B 33/12 (2006.01) C01B 33/145 (2006.01) C04B 41/50 (2006.01) C04B 41/85 (2006.01) C04B 41/87 (2006.01) C09D 1/00 (2006.01) C09D 183/00 (2006.01) C09D 183/02 (2006.01) C23C 26/00 (2006.01)
Patent
CA 2179645
A suspension containing a novel reactive ultrafine particulate silica having a radius of gyration of at most 10 .ANG., has an excellent storage stability, and provides excellent various properties as a hard coating composition.
L'invention concerne une nouvelle suspension contenant des particules de silice réactives ultra-fines possédant un rayon inertiel de 10 ANGSTROM ou moins, et présentant une excellente stabilité au stockage ainsi que d'excellentes caractéristiques en tant que composition de revêtement dur.
Kato Hanako
Matsuzoe Nobuyuki
Sawai Takeshi
Tanaka Seiichiro
Mitsubishi Chemical Corporation
Smart & Biggar
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