Ultrahigh vacuum focused ion beam micromill and articles...

H - Electricity – 01 – J

Patent

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Details

H01J 37/304 (2006.01) B23K 26/00 (2006.01) G06F 19/00 (2006.01) H01J 37/305 (2006.01)

Patent

CA 2186893

An ultrahigh vacuum focused ion beam micromilling apparatus and process are disclosed which can achieve high aspect ratios in a chemical-assist free environment. An ultrahigh vacuum chamber (10) includes a number of ports for viewing to a target substrate, for filming of the target substrate, for insertion or manipulation of the target substrate, and for various analyses of the target substrate. Port (12) can be a view port with port (14) being used for a camera port. Additionally, a durable data storage medium using the micromilling process is disclosed, the durable data storage medium capable of storing, e.g., digital or alphanumeric characters as well as graphical shapes or characters.

La présente invention concerne un appareil de micro-usinage sous ultravide par faisceau ionique focalisé ainsi que le procédé correspondant. Cet appareil et ce procédé permettent d'obtenir des rapports de forme élevés dans des environnements excluant le recours à des moyens chimiques. Une chambre à ultravide (10) comporte un certain nombre d'orifices permettant d'observer un substrat cible, permettant de filmer le substrat cible, permettant d'introduire ou de manipuler le substrat cible, et permettant d'effectuer diverses analyses sur le substrat cible. Un orifice (12) peut être consacré à l'observation auquel cas un orifice (14) est destiné à une caméra. L'invention concerne également un support de stockage durable de données utilisant le procédé de micro-usinage, le support de stockage durable de données étant capable de mémoriser, par exemple, des caractères numériques ou alphanumériques mais aussi des formes ou des caractères graphiques.

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