B - Operations – Transporting – 01 – D
Patent
B - Operations, Transporting
01
D
B01D 61/00 (2006.01)
Patent
CA 2606440
A process for forming a porous nanoscale membrane is described. The process involves applying a nanoscale film to one side of a substrate, where the nanoscale film includes a semiconductor material; masking an opposite side of the substrate; etching the substrate, beginning from the masked opposite side of the substrate and continuing until a passage is formed through the substrate, thereby exposing the film on both sides thereof to form a membrane; and then simultaneously forming a plurality of randomly spaced pores in the membrane. The resulting porous nanoscale membranes, characterized by substantially smooth surfaces, high pore densities, and high aspect ratio dimensions, can be used in filtration devices, microfluidic devices, fuel cell membranes, and as electron microscopy substrates.
La présente invention concerne un procédé de formation d'une membrane nanoporeuse. En l'occurrence, on applique sur une face d'un substrat un film nanométrique comportant un matériau semi-conducteur. On masque la face opposée, et on attaque le substrat en partant de la face opposée masquée jusqu'à former un passage au travers du substrat, ce qui dégage le film des deux côtés pour former une membrane. Pour conclure, on réalise dans la membrane une pluralité de pores à intervalles aléatoires. Les membranes nanoporeuses obtenues, caractérisées par des surfaces sensiblement lisses, une haute densité de pores, des dimensions du rapport d'aspect élevées, conviennent particulièrement pour les dispositifs de filtration, les dispositifs microfluidiques, les membranes de piles à combustible, et les substrat de microscopie électronique.
Fauchet Philippe M.
Gaborski Thomas R.
Mcgrath James L.
Striemer Christopher C.
Gowling Lafleur Henderson Llp
University Of Rochester
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