Ultraviolet exposure arrangement for the production of masks

G - Physics – 02 – B

Patent

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Details

356/192

G02B 27/00 (2006.01) G03B 15/00 (2006.01) G03F 7/20 (2006.01) H04N 9/24 (2006.01)

Patent

CA 1272812

ABSTRACT The invention relates to an exposure arrangement for the production of masks, using a computer-aided design system, which arrangement comprises a cathode-ray tube which produces an image of the mask on the screen of the tube and an optical system which projects the image of the mask on to a substrata which is to be exposed. What characterizes the invention is that the cathode-ray tube is a high-brightness tube the screen of which is provided, firstly, with a phosphor which emits in the ultraviolet spectrum and, secondly, with a cooling circuit for the phosphor, and that the optical system is designed for use in the ultraviolet spectrum and operates on the ultraviolet image provided by the screen of the high-brightness tube.

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