Uniform gas distribution in large area plasma source

Details Uniform gas distribution in large area plasma source Uniform gas distribution in large area plasma source

H - Electricity

01

J

H01J 37/32 (2006.01)

Patent

CA 2386078

The apparatus generates a time-varying magnetic field through a field admission window (22) of plasma processing chamber (20) to create or sustain a plasma within the chamber by inductive coupling. It comprises: a magnetic core (38) presenting a pole face structure (38a), an inductor means (40) associated with the magnetic core, for generating a time-varying magnetic field throughout the pole face structure, means (42, 44, 48, 51) for injecting gas into said chamber and through said magnetic core.

L'invention concerne un appareil générant un champ magnétique variant dans le temps via la fenêtre (22) d'admission de champ d'une chambre (20) de traitement au plasma, de manière à créer ou à entretenir, par couplage inductif, un plasma à l'intérieur de ladite chambre. Ledit appareil comprend : un noyau magnétique (38) présentant une structure (38a) à face de pôle, des moyens d'induction (40), associés au noyau magnétique et destinés à générer un champ magnétique variant dans le temps dans toute la structure à face polaire, et des moyens (42, 44, 48, 51) destinés à injecter le gaz dans ladite chambre et au travers dudit noyau magnétique.

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