C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
96/150, 402/38,
C07C 69/708 (2006.01) C07D 317/30 (2006.01) C07D 317/32 (2006.01) C07D 319/06 (2006.01) C08F 124/00 (2006.01) G03F 7/004 (2006.01)
Patent
CA 1337771
Polymeric .beta.-keto-ester acetals which, in combination with compounds which release acid under the action of actinic radiation, are suitable as positive photoresists, which are suitable for the production of printing plates, printed circuit boards, integrated circuits or silver-free films, can be prepared by free-radical polymerization from compounds of the formula I or II Image (I) Image (II) in which n is zero, 1 or 2 and, for example, R1 is an H atom, C1-C10- alkyl, phenyl or benzyl, R2, R3, R4, R5, R6, R7 and R3 independently of one another are each an H atom, halogen atom, C1-C10alkyl, phenyl, naphthyl or the radical -COOR9, Image or -SO2R9, in which R9 is C1-C6alkyl or phenyl, X is O, S or NR10, in which R10 is an H atom, C1-C6alkyl or phenyl, Y is a radical of the following formulae Image , Image , Image , Image , Image , Image , Image or Image in which R11 is an H atom, C1-C6alkyl or phenyl and Z is an aliphatic radical containing at least two methylene groups, and R12 and R13 independently of one another are each C1-C10alkyl, phenyl or naphthyl.
602272
Hunziker Max
Schulthess Adrian
Ag Ciba-Geigy
Fetherstonhaugh & Co.
LandOfFree
Unsaturated .beta.-keto-ester acetals and their uses does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Unsaturated .beta.-keto-ester acetals and their uses, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Unsaturated .beta.-keto-ester acetals and their uses will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1332244