Unsymmetrical elliptical reflector for spatial illumination

F - Mech Eng,Light,Heat,Weapons – 21 – V

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F21V 7/09 (2006.01) F21V 7/08 (2006.01) F21V 7/12 (1995.01)

Patent

CA 2240669

An unsymmetrical elliptical reflector for spatial illumination. The invention includes a novel reflector and a novel illumination system including the novel reflector. The novel reflector (26) includes first (27) and second (29), non- symmetrical, elliptical elongate reflector surfaces. The eccentricities of the first and second reflector surfaces are different such that they have common first foci (30) and different conjugate foci (32, 34). The novel illumination system incorporates the novel reflector and provides intense, focused illumination at two foci (32, 34) positioned at two heights above a conveyor surface (12). The illumination intensity between the two foci is sufficiently intense to provide adequate illumination of encoded labels (16) carried on package (14) surfaces at heights between the two foci.

L'invention se rapporte à un réflecteur elliptique asymétrique pour éclairage spatial, ainsi qu'à un nouveau système d'éclairage comprenant ce nouveau réflecteur (26). Ce dernier comprend des première (27) et seconde (29) surfaces allongées, elliptiques, non symétriques. Les excentricités des première et seconde surfaces du réflecteur diffèrent en ce qu'elles comportent des premiers points de convergence communs et différents points de convergence conjugués (32, 34). Le nouveau système d'éclairage comprend le nouveau réflecteur et génère un éclairage focalisé, intense au niveau des deux points de convergence (32, 34) positionnés sur deux niveaux au-dessus d'une surface (12) de transport. L'intensité de l'éclairage entre les deux point de convergence est suffisamment forte de façon à assurer, à certaines hauteurs entre les deux points de convergence, un éclairage adéquat des étiquettes codées (16) placées sur des surfaces (14) d'emballages.

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