C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/258
C07D 239/54 (2006.01)
Patent
CA 1078840
ABSTRACT OF THE DISCLOSURE Uracil derivatives of formula (I) Image (I) are provided wherein R1 and R3, which may be the same or different, are each selected from an alkyl radical of 1 to 10 carbon atoms and an alkenyl radical of 3 to 10 carbon atoms; R5 is an alkyl : group of 1 to 5 carbon atoms and X is a hydrogen atom; the derivatives have a fungi/static effect. Preparation of these derivatives is also disclosed. ;,,. .
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