C - Chemistry – Metallurgy – 08 – K
Patent
C - Chemistry, Metallurgy
08
K
400/7402
C08K 5/00 (2006.01) C09D 3/72 (1980.01)
Patent
CA 1039881
A B S T R A C T A urethane-base sealing material comprising a polyurethane mate- rial, an anti-slump agent such as colloidal silica or bentonite, and an anti- slump additive used in combination with the anti-slump agent and selected from the group consisting of a sulfoxide of the formula R1SOR2 (wherein R1 and R2 independently represent lower alkyl and an amide of the formula R3CONR4R5 or Image (wherein R3, R4, R5 and R6 independently represent hydrogen or lower alkyl), whereby the thixotropic properties of the polyurethane sealant mixture are markedly improved.
197657
Asai Kiyotsugu
Fukuda Kiyou
Kawabata Toshihiko
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