C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 9/655 (2006.01) A61K 8/67 (2006.01) A61K 9/127 (2006.01) A61K 31/355 (2006.01) A61K 31/665 (2006.01) A61Q 1/02 (2006.01) A61Q 17/00 (2006.01) A61Q 19/00 (2006.01) A61K 7/02 (1990.01) A61K 7/06 (1990.01) A61K 7/48 (1990.01)
Patent
CA 2114225
ABSTRACT OF THE DISCLOSURE The present invention relates to the use of a tocopherol phosphate, other than alpha-tocopherol phosphate, especially in its dl or d form, or one of its esters having general formula (I): Image (I) in which: R' is hydrogen atom, an alkyl radical having from 1 to 4 carbon atoms, such as the methyl or ethyl radical in particular, R'O is a tocopheryl radical; R" is a hydrogen atom, an alkyl radical having from 1 to 4 carbon atoms, such as the methyl or ethyl radical in particular, or R"O is an oxyethylene chain, of formula Image in which R4 and R5 are independently a hydrogen atom or a methyl radical, and n is an integer of 1 or over; R1, R2 and R3 are independently a hydrogen atom or a methyl radical, it being understood that R1, R2 and R3 cannot simultaneously be a methyl radical. A represents the groups: Image or Image or one of its cosmetically or pharmaceutically acceptable salts in the preparation of a cosmetic or pharmaceutical, especially dertmatological, composition characterized by having a reduced allergizing or irritating potential, or used in the prevention or treatment of allergic conditions, such as cutaneous allergy or bronchial or inflammatory asthma, or in the prevention or treatment of the harmful effects of free radicals.
Bonte Frederic
Dumas Marc
Marechal Christian
Meybeck Alain
Fetherstonhaugh & Co.
L.v.m.h. Recherche
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