Use of an oxygen-containing plasma to develop a...

Details Use of an oxygen-containing plasma to develop a... Use of an oxygen-containing plasma to develop a...

G - Physics

03

C

96/269

G03C 5/18 (2006.01) G03F 7/022 (2006.01) G03F 7/26 (2006.01) G03F 7/36 (2006.01)

Patent

CA 1132832

Plasma Development of Resists Abstract Exposed patterns in phenol-formaldehyde Novolak resin/diazo ketone resist layers are developed in an oxygen plasma by treating the resist layers, prior to development, with a magnesium salt. This produces a negative pattern. Positive patterns are produced by combining the process with decar- boxylation of the exposed areas followed by blanket exposure. FI9-79-063

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