C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 405/06 (2006.01) A61K 31/37 (2006.01) A61K 31/395 (2006.01) A61K 31/445 (2006.01) A61K 31/47 (2006.01) A61K 31/535 (2006.01) C07D 311/08 (2006.01) C07D 311/18 (2006.01) C07D 493/04 (2006.01)
Patent
CA 2167071
- 26 - Use of compounds of formula I Image (I) in which R1, R2, R3, R4, Y and Z have the meanings stated in the claims, tautomers thereof as well as their salts with non-toxic acids or bases for the production of pharmaceutical agents having an inhibitory action on PLA2 in addition to compounds of formula I in which X does not denote a valency and processes for the production thereof.
On utilise des composés de la formule (I), dans laquelle R1, R2, R3, R4, Y et Z ont les significations données dans les revendications, leurs tautomères et leurs sels avec des acides ou des bases non toxiques, pour produire des médicaments à effet inhibiteur de la PLA2, ainsi que des composés de la formule (I), dans laquelle X ne représente pas une valence. L'invention concerne également un procédé de préparation de ces composés.
Friebe Walter-Gunar
Schafer Wolfgang
Scheuer Werner
Tibes Ulrich
Roche Diagnostics Gmbh
Swabey Ogilvy Renault
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