Use of glass laminate as a substrate in semiconductor devices

H - Electricity – 01 – L

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H01L 21/00 (2006.01) B32B 17/10 (2006.01) C03C 27/12 (2006.01) G02F 1/1333 (2006.01) G02F 1/1341 (2006.01) G03C 7/00 (2006.01) H05B 33/02 (2006.01)

Patent

CA 2306044

A method for making a semiconductor device is disclosed which comprises the step of applying a functional layer on a substrate, characterised in that said substrate is a laminate which comprises a support and a glass layer, said glass layer having a thickness of less than 700 µm. The support is preferably a plastic foil. The laminate has the combined benefits of low weight and high strength and is therefore a suitable substrate for making flat panel displays such as liquid crystal displays, plasma displays, field emission displays or organic light-emitting polymer displays. Preferred examples of the functional layer are e.g. electroconductive layers, liquid crystal orientation layers, colour filters, electroluminescent layers, passivation layers and phosphor layers.

On décrit un procédé de fabrication d'un dispositif semi-conducteur comprenant une étape d'application d'une couche fonctionnelle sur un substrat, ce procédé se caractérisant en ce que le substrat est un système mixte constitué d'un support et d'une couche de verre, cette dernière présentant une épaisseur inférieure à 700 microns. Le support est de préférence une feuille de plastique. Le système mixte bénéficie des avantages combinés de faible poids et de grande solidité et constitue par conséquent un substrat approprié pour fabriquer des affichages à écran plat tels que des affichages à cristaux liquides, des affichages à plasma, des affichages à émission par effet de champ ou des affichages polymères organiques électroluminescents. Des exemples préférés de couche fonctionnelle sont par exemple des couches électroconductrices, des couches d'orientation à cristaux liquides, des filtres colorés, des couches électroluminescentes, des couches de passivation et des couches au phosphore.

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