C - Chemistry – Metallurgy – 07 – K
Patent
C - Chemistry, Metallurgy
07
K
C07K 14/705 (2006.01) A61K 38/17 (2006.01) A61K 47/48 (2006.01) C07K 1/22 (2006.01) C08B 37/08 (2006.01) A61K 31/73 (1995.01)
Patent
CA 2193941
The use of an effective amount of a compound having the general formula R1R2N(CH2)mNR3R4 is provided for the inhibition of hyaluronan, wherein R1 and R2 are selected from H and (see fig. I) and R3 and R4 are selected from H, (see fig. II) , (see fig. III) and (see fig. IV) and wherein m is an integer from 1-10.
Utilisation d'une quantité efficace d'un composé de formule générale R1R2N(CH2)mNR3R4 pour l'inhibition de l'hyaluronan, R1 et R2 sont choisis parmi H et (voir fig. I), R3 et R4 sont choisis parmi H, (voir fig. II) , (voir fig. III) et(voir fig. IV), enfin m est un entier de 1 à 10.
Asculai Samuel Simon
Mccourt Peter
Turley Eva Anne
Hyal Pharmaceutical Corporation
Jagotec Ag
Ogilvy Renault
LandOfFree
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