C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 471/04 (2006.01) A61K 49/20 (2006.01) C07C 43/295 (2006.01) C07C 45/67 (2006.01) C07C 45/70 (2006.01) C07C 46/00 (2006.01) C07C 49/747 (2006.01) C07C 49/753 (2006.01) C07C 50/28 (2006.01) C07C 69/92 (2006.01) C07C 233/69 (2006.01) C07C 255/36 (2006.01) C07C 255/41 (2006.01) C07C 309/43 (2006.01) C07C 309/66 (2006.01) C07C 317/22 (2006.01) C07C 323/20 (2006.01) C07D 209/36 (2006.01) C07D 209/48 (2006.01) C07D 215/24 (2006.01) C07D 311/82 (2006.01) C07D 339/06 (2006.01) C07D 493/04 (2006.01) C07D 495/04
Patent
CA 2115260
2115260 9302711 PCTABS00019 The present invention provides the use of a persistent .pi.-system free radical for the manufacture of a contrast medium for use in magnetic resonance imaging, wherein the electron delocalising .pi.-system of said radical comprises at least one homo or heterocyclic ring, said radical being other than the chloranil semiquinone anion radical or a trityl radical. Also provided are magnetic resonance imaging contrast media containing and methods using such radicals.
Andersson Sven
Golman Klaes
Rise Frode
Wikstrom Hakan
Wistrand Lars-Goran
Fetherstonhaugh & Co.
Nycomed Innovation Ab
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