C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 335/32 (2006.01) C25D 3/12 (2006.01)
Patent
CA 2150906
Nickel-plated shaped parts are produced by galvanic precipitation of nickel from aqueous-acid baths which contain as essential constituents one or several nickel salts, one or several inorganic acids and one or several brighteners. As brighteners are used thiourea salts having general formula (I), in which R1 to R4 stand for hydrogen, C1 to C18-alkyl, which may be substituted by carboxyl groups, C1 to C4-alkoxycarbonyl groups or cyano groups, C2 to C12- alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, C1 to C4-alkoxy residues, halogen atoms, hydroxyl groups, phenyl groups, phenyl residues or C1 to C4 alkoxycarbonyl groups; Y stands for a chemical bond or for linear or branched alkylene, alkenylene or alkinylene having each up to 20 C atoms; A stands for hydrogen or a group having the formulae: -CO-H, -CO-R5, -CO-OH, -CO-OR5, -CO-NR6R7, -CO-CH2-CO-OR5, -O-CO-H, -O-CO-R5, -NR6-CO-R5, -NR6-CO-R5, -OR5, -SO2-R5, -SO2-OH, -SO2-OR5, -PO(PH)2,-PO(OH)(OR5),-PO(OR5)2, OPO(OH)2 -OPO(PH)(PR5) or -OPO(OR5)2 in which R5 stands for C1 to C12-alkyl, C2 to C12-alkenyl, C2 toC12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted bo one or two C1 to C4-alkyl residues, halogen atoms, hydroxyl groups, phenyl residues or C1 to C4-alkoxycarbonyl groups; and R6 and R7 stand for hydrogen or C1 to C4-alkyl; n is a number from 1 to 4 and X(?) stands for a water solubility-promoting, n-valent inorganic or organic anion.
Burkhart Bernd
Glaser Klaus
Oftring Alfred
Schroeder Ulrich
Schwendemann Volker
Basf Aktiengesellschaft
Borden Ladner Gervais Llp
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