Use of volatile carboxylic acids in improved photoresists...

Details Use of volatile carboxylic acids in improved photoresists... Use of volatile carboxylic acids in improved photoresists...

G - Physics

03

C

96/161, 96/266

G03C 1/06 (2006.01) C08G 8/28 (2006.01) C08L 61/14 (2006.01) G03F 7/023 (2006.01)

Patent

CA 1085212

Abstract of the Disclosure Photosensitive composltions and elements containing light sensitive polymeric compounds formed from the condensation reaction of quinone diazides with phenol-formaldehyde resins comprise the incorporation of a volatile carboxylic acid in said compositions and elements to improve the thermal stability, image quality and etch resistance. The novel photosensitive compositions are useful in photoresists as well as photo- sensitive elements, such as lithographic plates. - 1 -

232058

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