C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
402/516
C08F 212/12 (2006.01) C08F 212/14 (2006.01)
Patent
CA 1165947
ABSTRACT OF THE DISCLOSURE Copolymers of p-methylstyrene and methyl methacrylate containing 20 to 50 weight percent methyl methacrylate have improved resistance to UV light.
358818
Gowling Lafleur Henderson Llp
Prapas Aristotle G.
LandOfFree
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