Uv light resistant para-methylstyrene copolymer

C - Chemistry – Metallurgy – 08 – F

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402/516

C08F 212/12 (2006.01) C08F 212/14 (2006.01)

Patent

CA 1165947

ABSTRACT OF THE DISCLOSURE Copolymers of p-methylstyrene and methyl methacrylate containing 20 to 50 weight percent methyl methacrylate have improved resistance to UV light.

358818

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