Uv radiation system having materials for selectively...

Details Uv radiation system having materials for selectively... Uv radiation system having materials for selectively...

G - Physics

02

B

G02B 5/02 (2006.01) A61L 2/10 (2006.01) G02B 5/08 (2006.01) G02B 5/12 (2006.01)

Patent

CA 2314029

This invention provides a reflector for a radiation system comprising a diffuse reflective surface which reflects greater than 50 % of the radiation from 240 to 280nm. This invention further provides a radiation system comprising at least one radiation source and at least one reflector which at least partially encompasses said at least one radiation source wherein said at least one reflector is diffuse. 26

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