Vacuum deposition system and method

Details Vacuum deposition system and method Vacuum deposition system and method

C - Chemistry, Metallurgy

23

C

204/167, 32/24,

C23C 14/56 (2006.01) C23C 14/34 (2006.01)

Patent

CA 1140002

VACUUM DEPOSITION SYSTEM AND METHOD ABSTRACT A large scale vacuum deposition facility is disclosed in which substrates, in the form of architectural glass lights on supporting racks, are moved through an evacuated working chamber system where the substrates are coated by cathodic sputtering. The substrates racks are moved by a conveyor system through the working chamber system via an access chamber system, enabling substantially continuous production of coated substrates without requiring the working chamber system be opened to atmosphere. Operation of the working chamber system, the access chamber system, the conveyor system and associated components is monitored and governed from a process control console.

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